Method of high contrast positive O-quinone diazide photoresist d

Details Method of high contrast positive O-quinone diazide photoresist d Method of high contrast positive O-quinone diazide photoresist d

1984-10-17

1986-09-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430296, 430331, 430192, G03F 726

Patent

active

046135618

ABSTRACT:
A positive photoresist aqueous alkaline two-step developing method is provided that gives a high contrast to the photoresist.
The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a fluorocarbon or carboxylated surfactant. The incorporation of the fluorocarbon or carboxylated surfactant provides the unexpected increase in the contrast of the photoresist. A double dip method in effecting development of the exposed film is used. The contrast and sensitivity of the photoresist remains essentially unchanged over the life of the bath.
The high contrast photoresist provides linewidth control and affords improved processing uniformity in photoresist imaging.

REFERENCES:
patent: 3586504 (1971-06-01), Coates et al.
patent: 3868254 (1975-02-01), Wemmers
patent: 3891439 (1975-06-01), Katz et al.
patent: 3961100 (1976-06-01), Harris et al.
patent: 3961101 (1976-06-01), Barton
patent: 4212935 (1980-07-01), Canavello et al.
patent: 4275100 (1981-06-01), Datta
patent: 4302348 (1981-11-01), Requejo
patent: 4307178 (1981-12-01), Kaplan et al.
patent: 4359520 (1982-11-01), Carothers et al.
Gouss, G. et al., IBM Tech. Discl Bulletin, vol. 27, No. 1A, pp. 377-378, 6/1984.

Affiliated with

Also associated with

Rating

Method of high contrast positive O-quinone diazide photoresist d does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of high contrast positive O-quinone diazide photoresist d, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of high contrast positive O-quinone diazide photoresist d will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-766179