Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1997-02-03
1997-09-09
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430311, 430331, G03F 736
Patent
active
056655274
ABSTRACT:
The invention relates to a process for generating a negative tone resist image comprising the steps of (1) coating a substrate with a film of a polymeric composition comprising (i) a polymer, (ii) a photosensitive acid generator, and (iii) acid labile groups; (2) imagewise exposing the film to radiation to generate free acid; and (3) developing the image with critical fluid.
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Reichmanis et al., "A Novel Approach to c-nitrobenzyl Photochemistry for Resists", Journal of Vacuum Science Technology, vol. 19, No. 4, Nov./Dec. 1981, pp. 1338-1342.
Allen Robert David
Wallraff Gregory Michael
International Business Machines - Corporation
Martin Robert B.
Young Christopher G.
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