Process for generating negative tone resist images utilizing car

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430311, 430331, G03F 736

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056655274

ABSTRACT:
The invention relates to a process for generating a negative tone resist image comprising the steps of (1) coating a substrate with a film of a polymeric composition comprising (i) a polymer, (ii) a photosensitive acid generator, and (iii) acid labile groups; (2) imagewise exposing the film to radiation to generate free acid; and (3) developing the image with critical fluid.

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O'Brien, "Novolac-based Photoresists Combining Chemical Amplification and Dissolution Inhibition", Polymer Engineering and Science, vol. 29, No. 13, Mid-Jul. 1989, pp. 846-849.
Reichmanis et al., "A Novel Approach to c-nitrobenzyl Photochemistry for Resists", Journal of Vacuum Science Technology, vol. 19, No. 4, Nov./Dec. 1981, pp. 1338-1342.

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