Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-12-05
2000-02-29
Tentoni, Leo B.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118505, 118721, C23C 1434, C23C 1600
Patent
active
060305134
ABSTRACT:
A mask for covering a substrate for performing capacitance-voltage measurements on the substrate is a full-faced mask covering substantially all of the substrate. The mask may include a ring with one or more strips across the ring with holes in the strips for target material deposition. In an alternative embodiment, the mask may be a disk with holes at various locations across the disk. In either embodiment, the mask generally conforms to the shape of the substrate, so that the clamp ring of the PVD chamber seats on the mask or on the substrate, so little or none of the plasma or sputtered material can escape between the substrate and clamp ring. Various embodiments of the mask provide different ways to hold the mask on the substrate, such as clamping with clips, gluing with an adhesive, folding extensions of the mask over the edge of the substrate, and holding by surface tension.
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Ghantiwala Nayana
Patadia Nalin
Applied Materials Inc.
Tentoni Leo B.
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