Process for forming patterned layer of fluorinated resin and dev

Details Process for forming patterned layer of fluorinated resin and dev Process for forming patterned layer of fluorinated resin and dev

1993-08-17

1997-02-04

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430325, 430315, 430296, 430967, 430942, 430945, 430944, 430326, G03F 740, G03F 738

Patent

active

055996540

ABSTRACT:
A resin or amorphous carbon layer is coated on a substrate and then fluorinated by exposing it in a F.sub.2 gas atmosphere. The thus fluorinated resin or amorphous carbon layer can be excellent in dielectric constant and thermal resistance. The resin may be photo-sensitive so that the resin can be patterned before the fluorination. Alternatively, the resin can be fluorinated before patterning.

REFERENCES:
patent: 4144374 (1979-03-01), Lagow et al.
patent: 4717623 (1988-01-01), Brown et al.
patent: 5137754 (1992-08-01), Watanabe
Mitsubishi, Derwent Abstract frow Commerical Database--89-035739 of Japanese Patent Document 63-308920 A dated Dec. 16, 1988.
H. Y. Lu et al., J. vac. Sci. Technol. A. vol. 10, No.3, 450 May-Jun. 1992.
R. J. Lagow et al. Polymer Letters Edition, vol.12, pp. 177-184 (1984) no month.

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