Process for preparing image-bearing plates

Details Process for preparing image-bearing plates Process for preparing image-bearing plates

1986-10-14

1989-10-31

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430331, 430330, 430309, 430270, G03C 516

Patent

active

048777196

ABSTRACT:
Disclosed is a process for preparing an image-bearing plate for use in a lithographic printing plate, a photoresist or the like. The process comprises, after imagewise exposing a light-sensitive plate comprising a support having provided thereon a light-sensitive layer comprising a compound capable of producing an acid upon irradiation with actinic rays, a compound having at least one acid-decomposable group, and an alkali-soluble resin, treating the exposed plate with hot water of at least 25.degree. C. for a period of at least 10 seconds, prior to development. It is possible to achieve high sensitivity regardless of the interval between the exposure and the development.

REFERENCES:
patent: 4506006 (1985-03-01), Ruckert
A. A. Arcus and J. E. Doughty, "Positive Resist Development Process for Metal Etch", IBM Technical Disclosure Bulletin, vol. 15, No. 11, Apr. 1973, p. 3537.
Hiroshi; Ito and Grant Willson, "Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing", from Polymers in Electronics, edited by Theodore Davidson, ACS Symposium Series 242 based on Symposium by Division of Organic Coating and Plastics Chemistry at 185th Meeting of ACS. Seattle, Washington, Mar. 20-25, 1983, American Chemical Society, USA, 1984, pp. 11-23.
Donald Johnson, "Thermolysis of Positive Photoresists", SPIE, vol. 469, Advances in Resist Technology (1984), pp. 72-79.

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