Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent
1987-05-15
1988-07-19
Rosenberger, R. A.
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
G01B 1100
Patent
active
047580941
ABSTRACT:
A process and apparatus for qualifying a reticle, master pattern, or the like, in-situ as it is used in a system for photolithographically creating an image on a substrate, including the steps of coating a transparent substrate with a layer of transparent photoresist material, placing the coated substrate with a layer of transparent photoresist material, placing the coated substrate on a substrate supporting means, using a source of illumination in combination with a reticle, or master pattern, to create an image of the reticle, or master pattern, on the substrate, thereby exposing the photo resist coated on the surface thereof, removing the substrate from the supporting means, developing the exposed photoresist to produce a transparent patterned mask on the surface of the substrate, said patterned mask corresponding to the pattern on the reticle, or master pattern, and, in combination with the substrate, forming a monitor object, inspecting the monitor object by passing light through both the transparent masked and transparent unmasked areas of the substrate to detect defects, and using the detected defects as a measure of the quality of the reticle or master pattern.
REFERENCES:
patent: 4115120 (1978-09-01), Dyer et al.
patent: 4349880 (1982-09-01), Southgate et al.
patent: 4443096 (1984-04-01), Johannsmeier et al.
patent: 4586822 (1986-05-01), Taniimoto
patent: 4623608 (1986-11-01), Andrevski
patent: 4633504 (1986-12-01), Wihl
patent: 4641353 (1987-02-01), Kobayashi
patent: 4648053 (1987-03-01), Fridge
KLA-210 Series High-Speed Automatic Photomask Inspection System, KLA Instruments Corporation, Data Sheet 1986.
KLA 2020 Wafer Inspector, KLA Instruments Corporation, Data Sheet, 1984.
Klaris Automatic Reticle Inspection System, KLA Instruments Corporation, Data Sheet (Undated).
Klaris Automatic Reticle and Photomask Inspection System, KLA Instruments Corporation Data Sheet, 1986.
ARQUS-20 Automatic Reticle Qualification System, Sony Corporation Data Sheet (Undated).
DSW Wafer Stepper Model 6200, GCA Corporation IC Systems Group Data Sheet, 12/82.
NSR-1505G2A Step-and-Repeat System, A fully automated high-resolution system for high-volume VLSI production of large-format wafers, Nikon Precision Inc. Data Sheet (Undated).
3WD36 Automatic Wafer Inspection System, NJS Corporation Data Sheet (Undated).
Opticle Microlithograph IV, Proceedings of SPIE Volume 538,1985.
Die-to-Database Inspection--An Effective Method of Detecting and Locating Defects on Reticles, Eileen Jozefov et al., Solid State Technology, Jan. 1987, pp. 79-82.
Qualifying Reduction Reticles, Semiconductor International, Aug. 1984, pp. 68-73.
Photomask and Reticle Defect Detection, Semiconductor International, Apr. 1985, pp. 66-73.
7MD62-7MD63 Automatic Mask/Reticle Inspection System, NJS Corporation Data Sheet (Undated).
Wihl Tim S.
Yasher Frank D.
KLA Instruments Corp.
Rosenberger R. A.
LandOfFree
Process and apparatus for in-situ qualification of master patter does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and apparatus for in-situ qualification of master patter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for in-situ qualification of master patter will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-594210