Resist compositions for chemically amplified resists comprising

Details Resist compositions for chemically amplified resists comprising Resist compositions for chemically amplified resists comprising

1996-08-30

1998-03-31

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430170, 430905, 430910, G03F 7039

Patent

active

057337047

ABSTRACT:
A resist composition by which high resolution patterns can be formed in a lithography process, due to its high sensitivity to light and large difference in solubilities in a developing solution before and after exposure to light, and which has excellent thermal characteristics. The resist composition is suitable for manufacturing highly integrated semiconductor chips.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5034305 (1991-07-01), Nguyen-Kim et al.
patent: 5035979 (1991-07-01), Nguyen-Kim et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5412050 (1995-05-01), Watanabe et al.
patent: 5523370 (1996-06-01), Watanabe et al.
patent: 5532106 (1996-07-01), Frechet et al.
Choi et al., "Design and Properties of New Deep-UV Positive Photoresist", SPIE's 1996 International Symposium on Microlithography, Mar. 10-15, 1996, p. 15.

Affiliated with

Also associated with

Rating

Resist compositions for chemically amplified resists comprising does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist compositions for chemically amplified resists comprising , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist compositions for chemically amplified resists comprising will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-50495