Methods and compositions for the selective etching of silicon

Details Methods and compositions for the selective etching of silicon Methods and compositions for the selective etching of silicon

1992-09-17

1995-07-11

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

252 791, 252 795, H01L 2100

Patent

active

054317770

ABSTRACT:
Methods and compositions for the selective etching of silicon in the presence of p-doped silicon are disclosed whereby a portion of a silicon surface may be dissolved while a p-doped pattern in the surface remains substantially undissolved. The compositions comprise (a) an aqueous solution of an alkali metal hydroxide or a tetraalkylammonium hydroxide; and (b) a high flash point alcohol, phenol, polymeric alcohol, or polymeric phenol.

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