Solvent and resist spin coating apparatus

Details Solvent and resist spin coating apparatus Solvent and resist spin coating apparatus

1996-07-26

1999-08-24

Edwards, Laura

Coating apparatus

With means to centrifuge work

118 56, 118 64, 118 66, 118302, 118313, 118319, 118321, 118323, B05C 500

Patent

active

059420359

ABSTRACT:
An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution on a central portion of the substrate. The first and second nozzles are supported by a head such that the supported nozzle moves between a dropping position above the substrate and a waiting position offset from the substrate. The solvent and coating solution are diffused along the surface of the substrate by rotating the spin chuck.

REFERENCES:
patent: 4564280 (1986-01-01), Fukuda
patent: 5002008 (1991-03-01), Ushijima et al.
patent: 5403397 (1995-04-01), Beckers et al.

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