Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-05-18
1991-07-23
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430306, 430906, 525 63, 528 75, G03C 1725
Patent
active
050343068
ABSTRACT:
A photocurable elastomeric mixture is described which contains a photopolymerization initiator; as binder, a graft polymer which is soluble or dispersible in water or an aqueous solution, the graft backbone of which is a polymer of diol components and diisocyanate components having at least 2 urethane groups in the molecule, onto which polymer chains of units of carboxylic acid vinyl esters having about 3 to 20 carbon atoms or their saponification products and optionally of further ethylenically unsaturated monomers or their saponification products are grafted; and at least one compound which is polymerizable by a free-radical polymerization and corresponds to the general formula ##STR1## wherein R.sub.1 denotes hydrogen or alkyl,
REFERENCES:
patent: 3630746 (1971-12-01), Takimoto et al.
patent: 3936254 (1976-02-01), Sawada et al.
patent: 4042386 (1977-08-01), Okai et al.
patent: 4423135 (1983-12-01), Chen et al.
patent: 4493807 (1985-01-01), Vyvial et al.
Gersdorf Joachim
Kroggel Matthias
Brammer Jack P.
Hoechst Aktiengesellschaft
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