Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2010-08-10
2011-11-15
Luu, Chuong A. (Department: 2892)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S614000, C438S656000, C438S622000, C438S459000
Reexamination Certificate
active
08058165
ABSTRACT:
A method of manufacturing according to an embodiment of the present invention includes forming a seed metal layer20aon a supporting substrate70, forming an interconnect layer10including an interconnect18on the seed metal layer20a, removing the supporting substrate70after forming the interconnect layer10, and patterning the seed metal layer20athus to form an interconnect20after removing the supporting substrate.
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Kawano Masaya
Kurita Yoichiro
Soejima Koji
Luu Chuong A.
Renesas Electronics Corporation
Young & Thompson
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