Method for damage avoidance in transferring an ultra-thin...

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Subsequent separation into plural bodies

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21568, C438S455000

Reexamination Certificate

active

07736996

ABSTRACT:
A method for damage avoidance in transferring a monocrystalline, thin layer from a first substrate onto a second substrate involves epitaxial growth of a sandwich structure with a strained epitaxial layer buried below a monocrystalline thin layer, and lift-off and transfer of the monocrystalline thin layer with the cleaving controlled to happen within the buried strained layer in conjunction with the introduction of hydrogen.

REFERENCES:
patent: 4846931 (1989-07-01), Gmitter et al.
patent: 5374564 (1994-12-01), Bruel
patent: 5583059 (1996-12-01), Burghartz
patent: 5877070 (1999-03-01), Goesele et al.
patent: 6029602 (2000-02-01), Bhatnagar
patent: 6033974 (2000-03-01), Henley et al.
patent: 6352909 (2002-03-01), Usenko
patent: 6573126 (2003-06-01), Cheng et al.
patent: 6642091 (2003-11-01), Tanabe
patent: 6713326 (2004-03-01), Cheng et al.
patent: 6806171 (2004-10-01), Ulyashin et al.
patent: 7223994 (2007-05-01), Chidambarrao et al.
patent: 2004/0166650 (2004-08-01), Yokokawa et al.
patent: 2005/0070071 (2005-03-01), Henley et al.
Binetti, S. et al.; “Passivation of Extended Defects in Silicon by Catalytically Dissociated Molecular Hydrogen”; J. Phys III France; Jul. 1997; pp. 1487-1493; Les Editions de Physique.
Office Action mailed Jun. 11, 2006 in U.S. Appl. No. 11/106849.
Final Rejection mailed Sep. 17, 2009 in U.S. Appl. No. 11/106849.
Yonehara, T. et al.; “Epitaxial layer transfer by bond and etch back of porous Si1”; Applied Physics Letters; Apr. 18, 1994; vol. 64; American Institute of Physics. Abstract is being submitted. Full Article available for purchase and was submitted in parent, U.S. Appl. No. 11/106,849.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for damage avoidance in transferring an ultra-thin... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for damage avoidance in transferring an ultra-thin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for damage avoidance in transferring an ultra-thin... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4247366

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.