Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2008-10-20
2010-06-08
Hoang, Quoc D (Department: 2892)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C257S316000, C257SE21681
Reexamination Certificate
active
07732278
ABSTRACT:
A split gate memory cell has a select gate, a control gate, and a charge storage structure. The select gate includes a first portion located over the control gate and a second portion not located over the control gate. In one example, the first portion of the select gate has a sidewall aligned with a sidewall of the control gate and aligned with a sidewall of the charge storage structure. In one example, the control gate has a p-type conductivity. In one example, the gate can be programmed by a hot carrier injection operation and can be erased by a tunneling operation.
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Prinz Erwin J.
Sadd Michael A.
Steimle Robert F.
Clingan, Jr. James L.
Dolezal David G.
Freescale Semiconductor Inc.
Hoang Quoc D
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