Method and apparatus for compensating metrology data for...

Details Method and apparatus for compensating metrology data for... Method and apparatus for compensating metrology data for...

2006-10-09

2010-06-15

Rodriguez, Paul L (Department: 2123)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S028000

Reexamination Certificate

active

07738986

ABSTRACT:
A method includes acquiring metrology data associated with a process. Bias information associated with the process is determined. The metrology data is adjusted based on the bias information to generate bias-adjusted metrology data. The bias-adjusted metrology data is filtered to identify and reject outlier data. The process is controlled based on the metrology data remaining after the rejection of the outlier data.

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Translation of Official Communication from German Patent Application Serial No. 10 2005 046 972.8-33 dated Apr. 27, 2006.
Office Action dated Sep. 17, 2008 from related U.S. Appl. No. 11/420,625.

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