Method of making non-volatile memory cell with embedded...

Static information storage and retrieval – Read/write circuit – Having fuse element

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S163000, C365S175000

Reexamination Certificate

active

07660181

ABSTRACT:
A method of making a nonvolatile memory device includes forming a first electrode, forming at least one nonvolatile memory cell comprising a first diode portion, a second diode portion and an antifuse separating the first diode portion from the second diode portion, and forming a second electrode over the at least one nonvolatile memory cell.

REFERENCES:
patent: 4646266 (1987-02-01), Ovshinsky et al.
patent: 4665428 (1987-05-01), Hockley et al.
patent: 5166760 (1992-11-01), Mori et al.
patent: 5432729 (1995-07-01), Carson et al.
patent: 5559732 (1996-09-01), Birge
patent: 5693556 (1997-12-01), Cleeves
patent: 5745407 (1998-04-01), Levy et al.
patent: 5751012 (1998-05-01), Wolstenholme et al.
patent: 5835396 (1998-11-01), Zhang
patent: 5915167 (1999-06-01), Leedy
patent: 5962911 (1999-10-01), Manley
patent: 5991193 (1999-11-01), Gallagher et al.
patent: 6014330 (2000-01-01), Endoh et al.
patent: 6034882 (2000-03-01), Johnson et al.
patent: 6111784 (2000-08-01), Nishimura et al.
patent: 6130835 (2000-10-01), Scheuerlein
patent: 6187617 (2001-02-01), Gauthier et al.
patent: 6236587 (2001-05-01), Gudesen et al.
patent: 6306718 (2001-10-01), Singh et al.
patent: 6420215 (2002-07-01), Knall et al.
patent: 6483736 (2002-11-01), Johnson et al.
patent: 6486065 (2002-11-01), Vyvoda et al.
patent: 6525953 (2003-02-01), Johnson
patent: 6541312 (2003-04-01), Vyvoda et al.
patent: 6567301 (2003-05-01), Anthony et al.
patent: 6584029 (2003-06-01), Tran et al.
patent: 6677220 (2004-01-01), Van Brocklin et al.
patent: 6693823 (2004-02-01), Brown
patent: 6735111 (2004-05-01), Nejad
patent: 6777773 (2004-08-01), Knall
patent: 6834008 (2004-12-01), Rinerson et al.
patent: 6844564 (2005-01-01), Tanaka et al.
patent: 6847544 (2005-01-01), Smith et al.
patent: 6873543 (2005-03-01), Smith et al.
patent: 6879508 (2005-04-01), Tran
patent: 6881994 (2005-04-01), Lee et al.
patent: 6916740 (2005-07-01), Kamins
patent: 6946719 (2005-09-01), Petti et al.
patent: 6950369 (2005-09-01), Kunikiyo et al.
patent: 6951780 (2005-10-01), Herner
patent: 6952030 (2005-10-01), Herner et al.
patent: 6952043 (2005-10-01), Vyvoda et al.
patent: 6965137 (2005-11-01), Kinney et al.
patent: 6995422 (2006-02-01), Herner et al.
patent: 6999366 (2006-02-01), Perner et al.
patent: 7038248 (2006-05-01), Lee
patent: 7071008 (2006-07-01), Rinerson et al.
patent: 7126855 (2006-10-01), Honda et al.
patent: 7176064 (2007-02-01), Herner
patent: 7180815 (2007-02-01), Fujiu et al.
patent: 7218550 (2007-05-01), Schwabe et al.
patent: 7224013 (2007-05-01), Herner et al.
patent: 7283403 (2007-10-01), Johnson
patent: 7453755 (2008-11-01), Cleeves
patent: 2003/0001230 (2003-01-01), Lowrey
patent: 2004/0016991 (2004-01-01), Johnson et al.
patent: 2004/0159867 (2004-08-01), Kinney
patent: 2004/0160818 (2004-08-01), Rinerson
patent: 2004/0161888 (2004-08-01), Rinerson
patent: 2004/0222467 (2004-11-01), Yamazaki et al.
patent: 2004/0228159 (2004-11-01), Kostylev et al.
patent: 2004/0232509 (2004-11-01), Vyvoda
patent: 2005/0052915 (2005-03-01), Herner et al.
patent: 2005/0063220 (2005-03-01), Johnson
patent: 2005/0098800 (2005-05-01), Herner et al.
patent: 2005/0121742 (2005-06-01), Petti et al.
patent: 2005/0121743 (2005-06-01), Herner
patent: 2005/0158950 (2005-07-01), Scheuerlein et al.
patent: 2006/0250836 (2006-11-01), Herner et al.
patent: 2006/0250837 (2006-11-01), Herner et al.
patent: 2007/0002603 (2007-01-01), Cleeves
patent: 2007/0069276 (2007-03-01), Scheuerlein et al.
patent: 2007/0072360 (2007-03-01), Kumar et al.
patent: 2007/0114509 (2007-05-01), Herner
patent: 2008/0017912 (2008-01-01), Kumar et al.
patent: 1 450 373 (2004-08-01), None
patent: 588352 (2004-05-01), None
patent: I 225716 (2004-12-01), None
patent: WO 2004/055827 (2004-07-01), None
International Search Report dated Oct. 8, 2008, received in International Application No. PCT/US2008/007800, 3 pgs.
Office Actions dated May 23, and Oct. 29, 2008 received in corresponding U.S. Appl. No. 11/693,858.
Office Action dated Nov. 24, 2008 received in corresponding U.S. Appl. No. 11/693,845.
Office Actions dated May 13, and Oct. 30, 2008 received in corresponding U.S. Appl. No. 11/819,077.
Office Action dated Oct. 29, 2008 received in corresponding U.S. Appl. No. 11/237,167.
Office Actions dated Oct. 1, 2007, Mar. 28, and Oct. 30, 2008 received in corresponding U.S. Appl. No. 11/496,986.
Office Action dated Mar. 19, 2009 received in related U.S. Appl. No. 11/496,986.
Taiwan Search Report dated Jan. 4, 2009 received in corresponding Taiwan Application No. 095135852.
U.S. Appl. No. 10/095,962, filed Mar. 13, 2002, Herner et al.
U.S. Appl. No. 10/185,507, filed Jun. 27, 2002, Vyvoda et al.
U.S. Appl. No. 10/440,882, filed May 19, 2003, Vyvoda et al.
U.S. Appl. No. 10/728,436, filed Dec. 5, 2003, Chen.
U.S. Appl. No. 10/728,451, filed Dec. 5, 2003, Cleeves et al.
U.S. Appl. No. 10/815,312, filed Apr. 1, 2004, Chen.
U.S. Appl. No. 10/883,417, filed Jun. 30, 2004, Raghuram et al.
U.S. Appl. No. 10/954,510, filed Sep. 29, 2004, Herner.
U.S. Appl. No. 11/148,530, filed Jun. 8, 2006, Herner et al.
U.S. Appl. No. 11/395,995, filed Mar. 31, 2006, Herner et al.
U.S. Appl. No. 11/444,936, filed May 31, 2006, Radigan et al.
U.S. Appl. No. 11/693,858, filed Mar. 30, 2007, Kumar et al.
U.S. Appl. No. 11/819,618, filed Jun. 28, 2007, Kumar et al.
Alavi et al, “A PROM Element Based on Salicide Agglomeration of Poly Fuses in a CMOS Logic Process”, IEDM 1997.
Amemiya et al., “Electrical Trimming of Heavily Doped Polycrystalline Silicon Resistors”, IEEE Transactions Electron Devices, vol. ED-26, No. 11, Nov. 1979.
Babcock, J. A. et al., “Polysilicon Resistor Trimming for Packaged Integrated Circuits”, IEDM 93, 1993, pp. 247-250.
Babcock, J. A. et al., “Precision Electrical Trimming of Very Low TCR Poly-Sige Resistors,” IEEE Service Center, vol. 21, No. 6, Jun. 2000, pp. 283-285, abstract Figs. 2, 4.
Das, Soumen et al., “Electrical Trimming of Ion-Beam-Sputtered Polysilicon Resistors by High Current Pulses”, IEEE Transaction of Electron Devices, vol. 41, No. 8, pp. 1429-1434, Aug. 1994.
Feldbaumer, D. W. et al., “Theory and Application of Polysilicon Resistor Trimming”, Solid-State Electronics, vol. 38, No. 11, 1995, pp. 1861-1869.
Feldbaumer, D.W., “Pulse Current Trimming of Polysilicon Resistors”, IEEE Transactions on Electron Devices, vol. 42, No. 4, pp. 689-696, Apr. 1995.
Kato, Kotaro et al., “A Monolithic 14 Bit D/A Converter Fabricated with a New Trimming Technique (DOT)”, IEEE Journal of Solid-State Circuits, vol. SC-19, No. 5, pp. 802-804-806, Oct. 1984.
Kato, Kotaro et al., “A Physical Mechanism of Current-Induced Resistance Decrease in Heavily Doped Polysilicon Resistors”, IEEE Transaction on Electron Devices, vol. ED-29, No. 8, pp. 1156-1160, Aug. 1982.
Kato, Kotaro et al., “Change in Temperature Coefficient of Resistance of Heavily Doped Polysilicon Resistors Caused by Electrical Trimming”, Jpn. J. Appl. Phys., vol. 35, Part 1, No. 8, pp. 14209-4215, Aug. 1996.
Lane, William A., “The Design of Thin-Film Polysilicon Resistors for Analog IC Applications”, IEEE Transactions on Electron Devices, vol. 36, No. 4, pp. 738-744, Apr. 1989.
Tobita, Toshio, “New Trimming Technology of a Thick Film Resistor by the Pulse Voltage Method”, IEEE Transactions on Components, Hybrids and Manufacturing Technology, vol. 14, No. 3, pp. 613-617, Sep. 1991.
Office Action dated Jul. 31, 2009 received in related U.S. Appl. No. 11/496,986.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making non-volatile memory cell with embedded... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making non-volatile memory cell with embedded..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making non-volatile memory cell with embedded... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4224832

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.