Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-03-22
2010-02-23
Monbleau, Davienne (Department: 2893)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C257SE21109
Reexamination Certificate
active
07666734
ABSTRACT:
A fuse used for redundancy function in a semiconductor device includes a pair of fuse terminals formed as a common layer with top interconnect lines by using a damascene technique, and a fuse element made of refractive metal and bridging the fuse terminals. The fuse element is formed as a common layer with the protective cover films covering the interconnect lines.
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patent: 2000-012691 (2000-01-01), None
Monbleau Davienne
Muirhead and Saturnelli LLC
NEC Electronics Corporation
Trinh Hoa B
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