Phase change memory device and method of forming the same

Static information storage and retrieval – Systems using particular element – Resistive

Reexamination Certificate

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Details

C365S163000, C257S002000, C257SE21536, C257SE29143, C438S382000

Reexamination Certificate

active

07667998

ABSTRACT:
A PRAM and method of forming the same are disclosed. In various embodiments, the PRAM includes a lower insulation layer formed on a semiconductor substrate, a phase change material pattern formed on the lower insulation layer and a heating electrode contacting the phase change material pattern. The heating electrode can be formed of a material having a positive temperature coefficient such that specific resistance of the material increases as a function of temperature.

REFERENCES:
patent: 5980785 (1999-11-01), Xi et al.
patent: 6569705 (2003-05-01), Chiang et al.
patent: 6797979 (2004-09-01), Chiang et al.
patent: 6849892 (2005-02-01), Hideki
patent: 6869883 (2005-03-01), Chiang et al.
patent: 6891749 (2005-05-01), Campbell et al.
patent: 7115927 (2006-10-01), Hideki et al.
patent: 7129560 (2006-10-01), Hamann et al.
patent: 7215564 (2007-05-01), Happ et al.
patent: 7236388 (2007-06-01), Hosoi et al.
patent: 2005/0029504 (2005-02-01), Karpov
patent: 2005/0104231 (2005-05-01), Chiang et al.
patent: 2009/0059651 (2009-03-01), Aoki
patent: 1020040017694 (2004-02-01), None
patent: 1020040078464 (2004-09-01), None
patent: 1020040100499 (2004-12-01), None
patent: 1020040079451 (2008-08-01), None
patent: 552681 (2003-09-01), None
patent: 559915 (2003-11-01), None
patent: 579593 (2004-03-01), None
patent: I229864 (2005-03-01), None
Cuong et al., “Characterizations of high resistivity TiNxOy thin films for applications in thin film resistors,” (Mar. 2007) Microelectronics Reliability No. 47, pp. 752-754.

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