Hybrid RF capacitively and inductively coupled plasma source...

Details Hybrid RF capacitively and inductively coupled plasma source... Hybrid RF capacitively and inductively coupled plasma source...

2006-07-18

2010-11-23

Alejandro, Luz L. (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With radio frequency antenna or inductive coil gas...

C118S7230IR, C118S7230AN, C156S345490

Reexamination Certificate

active

07837826

ABSTRACT:
A device for inductively confining capacitively coupled RF plasma formed in a plasma processing apparatus. The apparatus includes an upper electrode and a lower electrode that is adapted to support a substrate and to generate the plasma between the substrate and the upper electrode. The device includes a dielectric support ring that concentrically surrounds the upper electrode and a plurality of coil units mounted on the dielectric support ring. Each coil unit includes a ferromagnetic core positioned along a radial direction of the dielectric support ring and at least one coil wound around each ferromagnetic core. The coil units generate, upon receiving RF power from an RF power source, electric and magnetic fields that reduce the number of charged particles of the plasma diffusing away from the plasma.

REFERENCES:
patent: 4842683 (1989-06-01), Cheng et al.
patent: 5435881 (1995-07-01), Ogle
patent: 5685942 (1997-11-01), Ishii
patent: 5698062 (1997-12-01), Sakamoto et al.
patent: 5710486 (1998-01-01), Ye et al.
patent: 5865896 (1999-02-01), Nowak et al.
patent: 5944942 (1999-08-01), Ogle
patent: 5998932 (1999-12-01), Lenz
patent: 6019060 (2000-02-01), Lenz
patent: 6204607 (2001-03-01), Ellingboe
patent: 6422172 (2002-07-01), Tanaka et al.
patent: 6475336 (2002-11-01), Hubacek
patent: 6508913 (2003-01-01), McMillin et al.
patent: 6824627 (2004-11-01), Dhindsa et al.
patent: 6972524 (2005-12-01), Marakhtanov et al.
patent: 2003/0015965 (2003-01-01), Godyak
patent: 2003/0218427 (2003-11-01), Hoffman et al.
patent: 2004/0175953 (2004-09-01), Ogle
Yang, et al., Magnetically Enhanced Multiple Frequency Capacitively Coupled Plasmas: Dynamics and Strategies, Iowa State University, http://uigelz.ece.iastate.edu, Oct. 2005.
Lee, et al., Characterization of Inductively Coupled Plasma Driven with Ferrite Cores at 400 kHz, HanYang Univ., Seoul, Korea, Presentation at PEUG 2003.
PCT International Search Report and The Written Opinion of the International Searching Authority dated Sep. 19, 2008 [International Application No. PCT/US07/15928].

Affiliated with

Also associated with

Rating

Hybrid RF capacitively and inductively coupled plasma source... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hybrid RF capacitively and inductively coupled plasma source..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hybrid RF capacitively and inductively coupled plasma source... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4198056