Method of fabricating a microelectromechanical system (MEMS)...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C029S831000, C029S846000, C029S874000, C029S876000, C335S078000, C335S262000, C438S024000, C438S050000, C438S080000

Reexamination Certificate

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07657995

ABSTRACT:
A method of fabricating a MEMS switch that is fully integratable in a semiconductor fabrication line. The method consists of forming two posts, each end thereof terminating in a cap; a rigid movable conductive plate having a surface terminating in a ring in each of two opposing edges, the rings being loosely connected to guiding posts; forming upper and lower electrode pairs and upper and lower interconnect wiring lines connected and disconnected by the rigid movable conductive plate. The conductive plate moves up, shorting two upper interconnect wirings lines. Conversely, the conductive plate moves down when the voltage is applied to the lower electrode pair, while the upper electrode pair is grounded, shorting the two lower interconnect wiring lines and opening the upper wiring lines.

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patent: 6399406 (2002-06-01), Chan et al.
patent: 6426687 (2002-07-01), Osborn
patent: 6452124 (2002-09-01), York et al.
patent: 6504118 (2003-01-01), Hyman et al.
patent: 6777629 (2004-08-01), Lane et al.
patent: 6841839 (2005-01-01), Sridhar et al.
patent: 7373717 (2008-05-01), Lee et al.

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