Printing plate and patterning method using the same

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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C430S302000, C430S325000, C430S323000, C430S324000

Reexamination Certificate

active

07807339

ABSTRACT:
A patterning method includes depositing a pattern target layer on a surface of a substrate, providing a printing plate with concaves in a first side of a transparent substrate and an opaque layer on the first side except in the concaves of the first sides, filling resins into the concaves of the printing plate, positioning the substrate of the printing plate to correspond to an upper portion of the pattern target layer, and transferring resins of the printing plate onto the pattern target layer by exposing resins to a curing light to harden resins.

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patent: 2001/0033998 (2001-10-01), Fujio
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patent: 2003/0080471 (2003-05-01), Chou
patent: 2004/0081921 (2004-04-01), Yamashita
patent: 2004/0178170 (2004-09-01), Morimoto
patent: 2005/0158987 (2005-07-01), Choi

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