Non-volatile semiconductor storage device and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S326000, C257SE21442, C257SE29309, C257SE21692, C257SE27103, C438S287000, C365S148000, C365S185010

Reexamination Certificate

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07847342

ABSTRACT:
A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a first columnar semiconductor layer extending in a direction perpendicular to a substrate and having a first hollow extending downward from its upper end; a first insulation layer formed in contact with the outer wall of the first columnar semiconductor layer; a second insulation layer formed on the inner wall of the first columnar semiconductor layer so as to leave the first hollow; and a plurality of first conductive layers formed to sandwich the first insulation layer with the first columnar semiconductor layer and functioning as control electrodes of the memory cells.

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U.S. Appl. No. 12/501,142, filed Jul. 10, 2009, Fukuzumi et al.
U.S. Appl. No. 12/132,181, filed Jun. 3, 2008, Tanaka et al.
U.S. Appl. No. 12/325,023, filed Nov. 28, 2008, Fukuzumi et al.
U.S. Appl. No. 12/559,865, filed Sep. 15, 2009, Fuzumi et al.

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