Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2004-08-18
2010-12-07
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
Reexamination Certificate
active
07846647
ABSTRACT:
The present invention discloses a method of producing a pattern-formed structure, comprising the processes of: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of photocatalyst; preparing a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing photocatalyst; arranging the substrate for a pattern-formed structure and the photocatalyst-containing-layer side substrate such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a clearance of no larger than 200 μm therebetween; and irradiating energy to the characteristic-modifiable layer from a predetermined direction, and modifying characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer. According to this method, a highly precise pattern can be formed without necessity to carry out any post-treatment after exposure. Further, there is no concern that the pattern-formed structure itself deteriorates because the produced pattern-formed structure is free of the photocatalyst.
REFERENCES:
patent: 4568149 (1986-02-01), Sugata et al.
patent: 5362591 (1994-11-01), Imai et al.
patent: 5455131 (1995-10-01), Kang et al.
patent: 5514500 (1996-05-01), Ham
patent: 5849435 (1998-12-01), Akram et al.
patent: 6231988 (2001-05-01), Kato et al.
patent: 6232034 (2001-05-01), Kasai et al.
patent: 6576379 (2003-06-01), Tanaka et al.
patent: 6613486 (2003-09-01), Ohtsu et al.
patent: 2003/0059686 (2003-03-01), Kobayashi
patent: 0932081 (1999-07-01), None
patent: 11-115335 (1999-04-01), None
patent: 11-245533 (1999-09-01), None
patent: 2000-249821 (2000-09-01), None
patent: 20002284468 (2000-10-01), None
Dai Nippon Printing Co. Ltd.
Duda Kathleen
Ladas & Parry LLP
Raymond Brittany
LandOfFree
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