Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-12-12
2009-10-13
Everhart, Caridad M (Department: 2895)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S702000, C257SE21206, C257SE21488
Reexamination Certificate
active
07601586
ABSTRACT:
A method of forming buried bit line DRAM circuitry includes collectively forming a buried bit line forming trench, bit line vias extending from the bit line forming trench, and memory array storage node vias within a dielectric mass using only two masking steps. Conductive material is simultaneously deposited to within the buried bit line forming trench, the bit line vias, and the memory storage node vias within the dielectric mass. Other aspects and implementations are contemplated.
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Liao Ann K.
Westphal Michael J.
Everhart Caridad M
Micro)n Technology, Inc.
Wells St. John P.S.
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