Positive resist composition and patterning process

Details Positive resist composition and patterning process Positive resist composition and patterning process

2007-11-20

2009-06-02

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000

Reexamination Certificate

active

07541133

ABSTRACT:
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]-dodecane structure, hydroxyadamantane units, monocyclic lactone units, and carboxylic acid units. The acid generator (B) is a specific sulfonium salt compound.

REFERENCES:
patent: 5714625 (1998-02-01), Hada et al.
patent: 5902713 (1999-05-01), Hada et al.
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6022666 (2000-02-01), Hada et al.
patent: 6063953 (2000-05-01), Hada et al.
patent: 6261738 (2001-07-01), Asakura et al.
patent: 6312867 (2001-11-01), Kinsho et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6512020 (2003-01-01), Asakura et al.
patent: 6916591 (2005-07-01), Ohsawa et al.
patent: 2005/0058938 (2005-03-01), Tachibana et al.
patent: 2006/0228648 (2006-10-01), Ohsawa et al.
patent: 9-95479 (1997-04-01), None
patent: 9-230588 (1997-09-01), None
patent: 9-301948 (1997-11-01), None
patent: 2906999 (1999-04-01), None
patent: 2000-314956 (2000-11-01), None
patent: WO-2004/074242 (2004-09-01), None
Journal of Photopolymer Science and Technology, vol. 19, pp. 313-318.
Journal of Photopolymer Science and Technology, vol. 19, pp. 327-334.
Journal of Photopolymer Science and Technology, vol. 18, pp. 381-387.

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