Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate
2007-10-02
2009-10-27
Hassanzadeh, Parviz (Department: 1792)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
Having glow discharge electrode gas energizing means
C118S7230ER, C118S7230IR, C156S345430, C156S345480, C361S234000
Reexamination Certificate
active
07608162
ABSTRACT:
A plasma processing apparatus includes a high-frequency power source for applying bias power to an electrode on which a substrate is disposed, an insulating layer formed on a surface of the electrode, a conductive material buried within the insulating layer, a feeder line connecting the high-frequency power source and the conductive material, a variable capacitor provided in the feeder line, and a direct current power source connected to the electrode at a position between the electrode and the high-frequency power source. One portion of the insulating layer where the conductive material is buried formed on an outer part of the electrode has a thickness which is greater than a thickness of another portion of the insulating layer where the conducting material is not buried and which extends from a central part of the electrode to the one portion of the insulating layer.
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Kanai Saburou
Kawahara Hironobu
Ohmoto Yutaka
Takahashi Kazue
Yoshioka Ken
Antonelli, Terry Stout & Kraus, LLP.
Dhingra Rakesh K
Hassanzadeh Parviz
Hitachi , Ltd.
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