Semiconductor device and method for fabricating the same

Details Semiconductor device and method for fabricating the same Semiconductor device and method for fabricating the same

2007-08-10

2009-06-23

Tran, Long K (Department: 2818)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S003000, C438S207000, C438S227000, C438S258000, C438S393000, C257SE21009, C257SE21648, C257SE21660, C257SE21661, C257SE21668

Reexamination Certificate

active

07550344

ABSTRACT:
A semiconductor device includes: a lower hydrogen-barrier film; a capacitor formed on the lower hydrogen-barrier film and including a lower electrode, a capacitive insulating film, and an upper electrode; an interlayer dielectric film formed so as to cover the periphery of the capacitor; and an upper hydrogen-barrier film covering the top and lateral portions of the capacitor. An opening, which exposes the lower hydrogen-barrier film where the lower hydrogen-barrier film is located around the capacitor, and which is tapered and flares upward, is formed in the interlayer dielectric film, and the upper hydrogen-barrier film is formed along the lateral and bottom faces of the opening, and is in contact with the lower hydrogen-barrier film in the opening.

REFERENCES:
patent: 6211035 (2001-04-01), Moise et al.
patent: 6249014 (2001-06-01), Bailey
patent: 6316275 (2001-11-01), Hopfner
patent: 6388281 (2002-05-01), Jung et al.
patent: 6395612 (2002-05-01), Amanuma
patent: 6509601 (2003-01-01), Lee et al.
patent: 6611014 (2003-08-01), Kanaya et al.
patent: 6723598 (2004-04-01), Lim et al.
patent: 6730951 (2004-05-01), Nagano et al.
patent: 6750492 (2004-06-01), Mikawa et al.
patent: 6818457 (2004-11-01), Suzuki
patent: 2001/0015430 (2001-08-01), Hartner et al.
patent: 2002/0149041 (2002-10-01), Lee
patent: 2004/0084701 (2004-05-01), Kanaya et al.
patent: 1 113 493 (2001-07-01), None
patent: 11-8355 (1999-01-01), None
patent: 11-126881 (1999-05-01), None
patent: 2001-007303 (2001-01-01), None
patent: 2001-036026 (2001-02-01), None
patent: 2001-237393 (2001-08-01), None
patent: 2003-086771 (2003-03-01), None
patent: 2003-174145 (2003-06-01), None
patent: 2001-85573 (2001-09-01), None
European Office Action issued in European Patent Application No. EP 03 02 6150, dated Jun. 15, 2007.

Affiliated with

Also associated with

Rating

Semiconductor device and method for fabricating the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and method for fabricating the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and method for fabricating the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4122954