Nonvolatile semiconductor memory and method for fabricating...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S315000, C257S324000, C257SE21495, C257SE23141, C438S627000

Reexamination Certificate

active

07622762

ABSTRACT:
A nonvolatile semiconductor memory includes a first semiconductor layer; second semiconductor regions formed on the first semiconductor layer having device isolating regions extended in a column direction; a first interlayer insulator film formed above the first semiconductor layer; a lower conductive plug connected to the second semiconductor regions; a first interconnect extended in a row direction; a second interlayer insulator formed on the lower conductive plug and the first interlayer insulator film; an upper conductive plug; and a second interconnect formed on the second interlayer insulator contacting with the top of the upper conductive plug extended in the column direction.

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Notification of Reason(s) for Refusal mailed on Jul. 28, 2009, by the Japanese Patent Office in copending Application No. 2003-197095 and English language translation thereof.

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