Semiconductor device with constricted current passage

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S178000, C438S199000, C438S202000, C438S217000, C438S218000, C438S230000, C438S257000, C257SE21638, C257SE21696

Reexamination Certificate

active

07569445

ABSTRACT:
A semiconductor device including a gate located over a semiconductor substrate and a source/drain region located adjacent the gate. The source/drain region is bounded by an isolation structure that includes a constricted current passage between the gate and the source/drain region.

REFERENCES:
patent: 4806999 (1989-02-01), Strauss
patent: 4821089 (1989-04-01), Strauss
patent: 4990802 (1991-02-01), Smooha
patent: 5838033 (1998-11-01), Smooha
patent: 5888861 (1999-03-01), Chien et al.
patent: 6566710 (2003-05-01), Strachan et al.
patent: 6730967 (2004-05-01), Lin
patent: 2002/0076876 (2002-06-01), Ker et al.
patent: 2004/0195634 (2004-10-01), Smooha

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