Positive resist compositions and patterning process

Details Positive resist compositions and patterning process Positive resist compositions and patterning process

2007-07-06

2009-11-03

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S913000, C526S281000, C526S282000

Reexamination Certificate

active

07611821

ABSTRACT:
A positive resist composition is provided comprising (A) a resin component having a carboxylic acid moiety protected with an acetal protective group which is decomposable under the action of an acid, wherein in the carboxylic acid moiety protected with an acetal protective group, deprotection occurs not by way of β-elimination, and (B) a photoacid generator. The resist composition exhibits a high resolution when processed by ArF lithography.

REFERENCES:
patent: 5714625 (1998-02-01), Hada et al.
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6063953 (2000-05-01), Hada et al.
patent: 6261738 (2001-07-01), Asakura et al.
patent: 6312867 (2001-11-01), Kinsho et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6639036 (2003-10-01), Park et al.
patent: 6710148 (2004-03-01), Harada et al.
patent: 6788477 (2004-09-01), Lin
patent: 6916591 (2005-07-01), Ohsawa et al.
patent: 7232639 (2007-06-01), Maeda et al.
patent: 9-73173 (1997-03-01), None
patent: 9-90637 (1997-04-01), None
patent: 9-95479 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-09-01), None
patent: 9-301948 (1997-11-01), None
patent: 2906999 (1999-06-01), None
patent: 2000-314956 (2000-11-01), None
patent: 2000-336121 (2000-12-01), None
patent: 2004-074242 (2004-09-01), None
Koji Arimitsu et al.; “Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging Materials”, Journal of Photopolymer Science and Technology, vol. 9, No. 1, 1996, pp. 29-30.
Koji Arimitsu et al.; “Sensitivity Enhancement of Chemical-Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivativates”; Journal of Photopolymer Science and Technology, vol. 8, No. 1, 1995, pp. 43-44.
Kazuaki Kudo et al.; “Enhancement of the Senesitivity of Chemical-Amplification-Type Photoimaging Materials by B-Tosyloxyketone Acetals”; Journal of Photopolymer Science and Technology, vol. 8, No. 1, 1995, pp. 45-46.

Affiliated with

Also associated with

Rating

Positive resist compositions and patterning process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist compositions and patterning process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist compositions and patterning process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4114243