Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-12-18
2009-02-03
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S330000, C430S311000, C430S313000, C430S914000, C430S921000, C430S925000, C430S945000, C430S966000, C556S460000, C556S462000
Reexamination Certificate
active
07485407
ABSTRACT:
Disclosed are a siloxane compound, a photoresist composition using the same, and a method of forming a pattern, wherein the siloxane compound is having a general formula:wherein R1 is a tertiary butyl group or a 1-(tert-butoxy)ethyl group, and R2 and R3 is each independently a lower alkyl group having 1 to 4 carbon atoms.
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patent: 5702620 (1997-12-01), Ohnishi et al.
patent: 6852468 (2005-02-01), Sato
patent: 2002/0168581 (2002-11-01), Takeda et al.
patent: 2003-177538 (2003-06-01), None
patent: 10-2004-0066720 (2004-07-01), None
Kim Boo-Deuk
Kim Do-Young
Kim Jae-Ho
Kim Young-Ho
Yun Hyo-Jin
Lee Sin J.
Lee & Morse P.C.
Samsung Electronics Co,. Ltd.
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