Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-11-06
2009-11-03
Purvis, Sue (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE27092
Reexamination Certificate
active
07612399
ABSTRACT:
A semiconductor integrated circuit device includes a first interlayer insulation film having a contact therein. The contact has an upper surface and including a void therein having an open upper portion. The device further includes a plasma damage reduction unit including a lower electrode conformably on the void of the contact and on the upper surface of the contact, a dielectric film on the lower electrode, and an upper electrode on the dielectric film. The thickness of the portion of the dielectric film in the void is smaller than the thickness of the portion of the dielectric film on the upper surface of the contact.
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patent: 6319824 (2001-11-01), Lee et al.
patent: 6541335 (2003-04-01), Iwasa
patent: 6627939 (2003-09-01), Yamaguchi
patent: 6815771 (2004-11-01), Kimura et al.
patent: 6869877 (2005-03-01), Rhodes et al.
patent: 2006/0163639 (2006-07-01), Ogawa
patent: 01-274028 (1989-11-01), None
patent: 1020040086701 (2004-10-01), None
Kim Weon-Hong
Song Min-Woo
Won Seok-Jun
Ahmed Selim
Myers Bigel & Sibley & Sajovec
Purvis Sue
Samsung Electronics Co,. Ltd.
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