Semiconductor integrated circuit devices

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE27092

Reexamination Certificate

active

07612399

ABSTRACT:
A semiconductor integrated circuit device includes a first interlayer insulation film having a contact therein. The contact has an upper surface and including a void therein having an open upper portion. The device further includes a plasma damage reduction unit including a lower electrode conformably on the void of the contact and on the upper surface of the contact, a dielectric film on the lower electrode, and an upper electrode on the dielectric film. The thickness of the portion of the dielectric film in the void is smaller than the thickness of the portion of the dielectric film on the upper surface of the contact.

REFERENCES:
patent: 6319824 (2001-11-01), Lee et al.
patent: 6541335 (2003-04-01), Iwasa
patent: 6627939 (2003-09-01), Yamaguchi
patent: 6815771 (2004-11-01), Kimura et al.
patent: 6869877 (2005-03-01), Rhodes et al.
patent: 2006/0163639 (2006-07-01), Ogawa
patent: 01-274028 (1989-11-01), None
patent: 1020040086701 (2004-10-01), None

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