Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-01-22
2009-10-20
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C326S044000, C326S044000, C326S044000, C326S044000, C526S242000, C526S256000, C526S258000, C526S265000, C526S266000, C526S270000, C526S282000, C526S284000, C526S286000, C526S294000, C526S295000, C526S309000, C526S313000, C526S316000, C526S333000, C526S334000
Reexamination Certificate
active
07604918
ABSTRACT:
A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below:wherein R1is a C1-C20hydrocarbon group or a C1-C20hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.
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Chemical Abstract 1995:638076—English abstract for Sheveleva et al “Synthesis of 4-hydroxy-4-perfluoroalkyl-1,6-diene polymers under high pressure”, Zhurnal Organicheskoi Khimii (1994), 30 (8), p. 1256-1258.
Cho Han-ku
Choi Sang-jun
Harness & Dickey & Pierce P.L.C.
Lee Sin J.
Samsung Electronics Co,. Ltd.
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