Silicon nitride films

Details Silicon nitride films Silicon nitride films

2006-02-24

2008-11-04

Sarkar, Asok K (Department: 2891)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C257SE21293

Reexamination Certificate

active

07446063

ABSTRACT:
A method of forming structures comprises depositing silicon nitride films simultaneously on a plurality of substrates at a first temperature, and heating the silicon nitride films at a temperature greater than the first temperature.

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