Deposition of metal oxide and/or low asymmetrical tunnel...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE29129, C257S239000, C257S315000, C257S325000, C257SE29274

Reexamination Certificate

active

07446368

ABSTRACT:
Structures and methods for programmable array type logic and/or memory devices with asymmetrical low tunnel barrier intergate insulators are provided. The programmable array type logic and/or memory devices include non-volatile memory which has a first source/drain region and a second source/drain region separated by a channel region in a substrate. A floating gate opposing the channel region and is separated therefrom by a gate oxide. A control gate opposes the floating gate. The control gate is separated from the floating gate by an asymmetrical low tunnel barrier intergate insulator formed by atomic layer deposition. The asymmetrical low tunnel barrier intergate insulator includes a metal oxide insulator selected from the group consisting of Al2O3, Ta2O5, TiO2, ZrO2, Nb2O5, SrBi2Ta2O3, SrTiO3, PbTiO3, and PbZrO3.

REFERENCES:
patent: 3738817 (1973-06-01), Benjamin
patent: 3833386 (1974-09-01), Wood et al.
patent: 3903232 (1975-09-01), Wood et al.
patent: 3926568 (1975-12-01), Benjamin et al.
patent: 3959191 (1976-05-01), Kehr et al.
patent: 4017322 (1977-04-01), Kawai et al.
patent: 4137200 (1979-01-01), Wood et al.
patent: 4293679 (1981-10-01), Cogliano
patent: 4295150 (1981-10-01), Adam
patent: 4302620 (1981-11-01), Chu
patent: 4358397 (1982-11-01), Chu
patent: 4403083 (1983-09-01), Marans et al.
patent: 4412902 (1983-11-01), Michikami et al.
patent: 4510584 (1985-04-01), Dias et al.
patent: 4545035 (1985-10-01), Guterman et al.
patent: 4556975 (1985-12-01), Smith et al.
patent: 4665417 (1987-05-01), Lam
patent: 4672240 (1987-06-01), Smith et al.
patent: 4688078 (1987-08-01), Hseih
patent: 4757360 (1988-07-01), Faraone et al.
patent: 4780424 (1988-10-01), Holler
patent: 4939559 (1990-07-01), DiMaria et al.
patent: 4940636 (1990-07-01), Brock et al.
patent: 4961004 (1990-10-01), Bryan et al.
patent: 4963753 (1990-10-01), Bryan et al.
patent: 4963754 (1990-10-01), Bryan et al.
patent: 4967085 (1990-10-01), Bryan et al.
patent: 4967087 (1990-10-01), Bryan et al.
patent: 4972086 (1990-11-01), Bryan et al.
patent: 4972516 (1990-11-01), Bryan et al.
patent: 4975014 (1990-12-01), Rufin et al.
patent: 4975588 (1990-12-01), Bryan et al.
patent: 4980559 (1990-12-01), Bryan et al.
patent: 4980560 (1990-12-01), Bryan et al.
patent: 4983847 (1991-01-01), Bryan et al.
patent: 4988880 (1991-01-01), Bryan et al.
patent: 4990282 (1991-02-01), Bryan et al.
patent: 4992205 (1991-02-01), Bryan et al.
patent: 4994205 (1991-02-01), Bryan et al.
patent: 4996003 (1991-02-01), Bryan et al.
patent: 5008034 (1991-04-01), Bryan et al.
patent: 5017791 (1991-05-01), Bryan et al.
patent: 5042011 (1991-08-01), Casper et al.
patent: 5057448 (1991-10-01), Kuroda
patent: 5071782 (1991-12-01), Mori
patent: 5073519 (1991-12-01), Rodder
patent: 5075536 (1991-12-01), Towe et al.
patent: 5084606 (1992-01-01), Bailey et al.
patent: 5095218 (1992-03-01), Bryan et al.
patent: 5153880 (1992-10-01), Owen et al.
patent: 5280205 (1994-01-01), Green et al.
patent: 5315142 (1994-05-01), Acovic et al.
patent: 5331188 (1994-07-01), Acovic et al.
patent: 5338953 (1994-08-01), Wake
patent: 5350738 (1994-09-01), Hase et al.
patent: 5353431 (1994-10-01), Doyle et al.
patent: 5399516 (1995-03-01), Bergendahl et al.
patent: 5418389 (1995-05-01), Watanabe
patent: 5429966 (1995-07-01), Wu et al.
patent: 5474947 (1995-12-01), Chang et al.
patent: 5488612 (1996-01-01), Heybruck
patent: 5497494 (1996-03-01), Combs et al.
patent: 5498558 (1996-03-01), Kapoor
patent: 5508544 (1996-04-01), Shah
patent: 5576567 (1996-11-01), Mori
patent: 5600592 (1997-02-01), Atsumi et al.
patent: 5608670 (1997-03-01), Akaogi et al.
patent: 5618575 (1997-04-01), Peter
patent: 5618761 (1997-04-01), Eguchi et al.
patent: 5619051 (1997-04-01), Endo
patent: 5619450 (1997-04-01), Takeguchi
patent: 5619642 (1997-04-01), Nielsen et al.
patent: 5627785 (1997-05-01), Gilliam et al.
patent: 5677867 (1997-10-01), Hazani
patent: 5691209 (1997-11-01), Liberkowski
patent: 5691230 (1997-11-01), Forbes
patent: 5703387 (1997-12-01), Hong
patent: 5705415 (1998-01-01), Orlowski et al.
patent: 5739544 (1998-04-01), Yuki et al.
patent: 5739567 (1998-04-01), Wong
patent: 5751038 (1998-05-01), Mukherjee
patent: 5768192 (1998-06-01), Eitan
patent: 5798548 (1998-08-01), Fujiwara
patent: 5801401 (1998-09-01), Forbes
patent: 5852306 (1998-12-01), Forbes
patent: 5880991 (1999-03-01), Hsu et al.
patent: 5888867 (1999-03-01), Wang et al.
patent: 5923056 (1999-07-01), Lee et al.
patent: 5936274 (1999-08-01), Forbes et al.
patent: 5952692 (1999-09-01), Nakazato et al.
patent: 5959465 (1999-09-01), Beat
patent: 5962959 (1999-10-01), Iwasaki et al.
patent: 5969383 (1999-10-01), Chang et al.
patent: 5973355 (1999-10-01), Shirai et al.
patent: 5981350 (1999-11-01), Geusic et al.
patent: 5986932 (1999-11-01), Ratnakumar et al.
patent: 5990605 (1999-11-01), Yoshikawa et al.
patent: 5991225 (1999-11-01), Forbes et al.
patent: 5998528 (1999-12-01), Tsipursky et al.
patent: 6009011 (1999-12-01), Yamauchi
patent: 6023124 (2000-02-01), Chuman et al.
patent: 6023125 (2000-02-01), Yoshikawa et al.
patent: 6025228 (2000-02-01), Ibok et al.
patent: 6025627 (2000-02-01), Forbes et al.
patent: 6031263 (2000-02-01), Forbes et al.
patent: 6066922 (2000-05-01), Iwasaki
patent: 6069380 (2000-05-01), Chou et al.
patent: 6069816 (2000-05-01), Nishimura
patent: 6077745 (2000-06-01), Burns, Jr. et al.
patent: 6087222 (2000-07-01), Jung Lin et al.
patent: 6087695 (2000-07-01), Chen
patent: 6091626 (2000-07-01), Madan
patent: 6093606 (2000-07-01), Lin et al.
patent: 6103419 (2000-08-01), Saidi et al.
patent: 6108240 (2000-08-01), Lavi et al.
patent: 6118147 (2000-09-01), Liu
patent: 6118159 (2000-09-01), Willer et al.
patent: 6124608 (2000-09-01), Liu et al.
patent: 6124729 (2000-09-01), Noble et al.
patent: 6125062 (2000-09-01), Ahn et al.
patent: 6130453 (2000-10-01), Mei et al.
patent: 6130503 (2000-10-01), Negishi et al.
patent: 6134175 (2000-10-01), Forbes et al.
patent: 6135175 (2000-10-01), Gaudreault et al.
patent: 6137025 (2000-10-01), Ebbinghaus et al.
patent: 6141238 (2000-10-01), Forbes et al.
patent: 6141248 (2000-10-01), Forbes et al.
patent: 6141260 (2000-10-01), Ahn et al.
patent: 6143636 (2000-11-01), Forbes et al.
patent: 6144155 (2000-11-01), Yoshikawa et al.
patent: 6147378 (2000-11-01), Liu et al.
patent: 6147443 (2000-11-01), Yoshikawa et al.
patent: 6153468 (2000-11-01), Forbes et al.
patent: 6157061 (2000-12-01), Kawata
patent: 6163049 (2000-12-01), Bui
patent: 6166487 (2000-12-01), Negishi et al.
patent: 6169306 (2001-01-01), Gardner et al.
patent: 6180461 (2001-01-01), Ogura
patent: 6180980 (2001-01-01), Wang
patent: 6184612 (2001-02-01), Negishi et al.
patent: 6191459 (2001-02-01), Hofmann et al.
patent: 6204529 (2001-03-01), Lung et al.
patent: 6208164 (2001-03-01), Noble et al.
patent: 6210999 (2001-04-01), Gardner et al.
patent: 6229175 (2001-05-01), Uchida
patent: 6238976 (2001-05-01), Noble et al.
patent: 6246606 (2001-06-01), Forbes et al.
patent: 6249020 (2001-06-01), Forbes et al.
patent: 6249460 (2001-06-01), Forbes et al.
patent: 6259198 (2001-07-01), Yanagisawa et al.
patent: 6274937 (2001-08-01), Ahn et al.
patent: 6278230 (2001-08-01), Yoshizawa et al.
patent: 6281042 (2001-08-01), Ahn et al.
patent: 6285123 (2001-09-01), Yamada et al.
patent: 6297103 (2001-10-01), Ahn et al.
patent: 6306708 (2001-10-01), Peng
patent: 6307775 (2001-10-01), Forbes et al.
patent: 6313518 (2001-11-01), Ahn et al.
patent: 6316298 (2001-11-01), Lee
patent: 6316873 (2001-11-01), Ito et al.
patent: 6317364 (2001-11-01), Guterman et al.
patent: 6320091 (2001-11-01), Ebbinghaus et al.
patent: 6323844 (2001-11-01), Yeh et al.
patent: 6335554 (2002-01-01), Yoshikawa
patent: 6341084 (2002-01-01), Numata et al.
patent: 6350704 (2002-02-01), Ahn et al.
patent: 6351411 (2002-02-01), Forbes et al.
patent: 6376312 (2002-04-01), Yu
patent: 6377070 (2002-04-01), Forbes
patent: 6388376 (2002-05-01), Negishi et al.
patent: 6396745 (2002-05-01), Hong et al.
patent: 6400070 (2002-06-01), Yamada et al.
patent: 6404124 (2002-06-01), Sakemura et al.
patent: 6404681 (2002-06-01), Hirano
patent: 6424001 (2002-07-01)

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Deposition of metal oxide and/or low asymmetrical tunnel... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Deposition of metal oxide and/or low asymmetrical tunnel..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Deposition of metal oxide and/or low asymmetrical tunnel... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4040446

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.