Methods for forming semiconductor wires and resulting devices

Details Methods for forming semiconductor wires and resulting devices Methods for forming semiconductor wires and resulting devices

2007-01-09

2008-12-16

Richards, N. Drew (Department: 2895)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S202000, C438S207000, C438S257000, C438S286000, C438S300000, C257SE21412, C257SE21415

Reexamination Certificate

active

07465636

ABSTRACT:
Methods for forming a wire from silicon or other semiconductor material are disclosed. Also disclosed are various devices including such a semiconductor wire. According to one embodiment, a wire is spaced apart from an underlying substrate, and the wire extends between a first end and an opposing second end, each of the first and second ends being affixed to the substrate. Other embodiments are described and claimed.

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