Field-effect transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S192000, C257S194000, C257SE29188, C257SE29246

Reexamination Certificate

active

07425721

ABSTRACT:
A field-effect transistor is provided which includes: a first nitride semiconductor layer having a lattice constant a1and a bandgap Eg1; a second nitride semiconductor layer stacked on the first nitride semiconductor layer and having a lattice constant a2and a bandgap Eg2; a source electrode and a drain electrode formed on the second nitride semiconductor layer; a piezo-effect film formed on the second nitride semiconductor layer in a region between the source electrode and the drain electrode; and a gate electrode formed on a region of the piezo-effect film. The relation between the lattice constants a1and a2is a1>a2. The relation between the bandgaps Eg1and Eg2is Eg1<Eg2. The residual polarization density at that surface of the piezo-effect film which faces the second nitride semiconductor layer is equal to or higher than the density of electric charges of a two-dimensional electron gas layer at an interface between the first nitride semiconductor layer and the second nitride semiconductor layer, and negative charges are polarized at that surface of the piezo-effect film which faces the second nitride semiconductor layer.

REFERENCES:
patent: 5192987 (1993-03-01), Khan et al.
patent: 2005/0189559 (2005-09-01), Saito et al.
patent: 2006/0214188 (2006-09-01), Kawasaki et al.
patent: 2006/0237711 (2006-10-01), Teraguchi
patent: 2004-273486 (2004-09-01), None
patent: 2004-335960 (2004-11-01), None
patent: 2005-79346 (2005-03-01), None
patent: 2005-244072 (2005-09-01), None
patent: 2006-32650 (2006-02-01), None
patent: 2006-156816 (2006-06-01), None
patent: 2006-269534 (2006-10-01), None
patent: 2006-332593 (2006-12-01), None
patent: 2007-109830 (2007-04-01), None
patent: 2007-165719 (2007-06-01), None
Myers et al., “GaN and Related Alloys—1999” Materials Research Society Symposium Proceeding, vol. 595, 1999, W6.2.7.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Field-effect transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Field-effect transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field-effect transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3988293

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.