Semiconductor memory device having self-aligned charge...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE29309, C257S314000

Reexamination Certificate

active

07345336

ABSTRACT:
A semiconductor memory device having a self-aligned charge trapping layer and a method of manufacturing the same in which a consistent length of an ONO layer is ensured. Here, an insulating stacked structure is self-aligned to a bottom surface of conductive spacers.

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Li et al. Damascene W/TiN Gate Mosfets with Improved Performance. IEEE Transactions on Electron Devices, vol. 49, No. 11, Nov. 2002.
Lubarsky et al. Quantitative evaluation of local charge trapping in dielectric stacked gate structures using Kelvin probe force microscopy. J. Vac. Sci. Technol. B 20(5), Sep./Oct. 2002.

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