Micro-mechanically strained semiconductor film

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S401000

Reexamination Certificate

active

07405444

ABSTRACT:
A semiconductor structure embodiment comprises a semiconductor membrane with local strained areas. The membrane with local strained areas is formed by a process including performing a local oxidation of silicon (LOCOS) process in a substrate and removing resulting oxide to form a recess in the substrate, and bonding a semiconductor membrane to the substrate to induce a strain where the membrane conforms to the recess in the substrate.

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