Apparatus for measuring feature widths on masks for the...

Details Apparatus for measuring feature widths on masks for the... Apparatus for measuring feature widths on masks for the...

2008-05-20

2008-05-20

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000

Reexamination Certificate

active

10711424

ABSTRACT:
An apparatus for measuring feature widths on masks1for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate16that is retained in vibrationally decoupled fashion in a base frame14; a scanning stage18, arranged on the carrier plate16, that carries a mask1to be measured, the mask1defining a surface4; and an objective2arranged opposite the mask1. A liquid25is provided between the objective2and the surface4of the mask1.

REFERENCES:
patent: 4008967 (1977-02-01), Kiemle
patent: 7130037 (2006-10-01), Lange
patent: 2003/0053037 (2003-03-01), Blaesing-Bangert et al.
patent: 2004/0065517 (2004-04-01), Watson et al.
patent: 2005/0052642 (2005-03-01), Shibata et al.
patent: 2441336 (1976-03-01), None
patent: 206 607 (1984-02-01), None
patent: 221 563 (1985-04-01), None
patent: 101 40 174 (2003-03-01), None
patent: 56113115 (1981-09-01), None

Affiliated with

Also associated with

Rating

Apparatus for measuring feature widths on masks for the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for measuring feature widths on masks for the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for measuring feature widths on masks for the... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3959834