Reaction chamber for an epitaxial reactor

Coating apparatus – Gas or vapor deposition

Reexamination Certificate

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Details

C118S730000, C118S728000, C156S345330, C156S345340, C156S345550

Reexamination Certificate

active

09807589

ABSTRACT:
Reaction chamer (10) for an epitaxial reactor comprising a belljar (14) made of insulating, transparent and chemically resistant material, a susceptor (24) provided with disk-shaped cavities (34a-n) for receiving wafers (36a-n) of material to be treated and having an insulating and chemically resistant plate (40) arranged above it, and a diffuser (54) consisting of a plurality of outlet pipes (106a-f) mounted on a cap (52) fixed to an upper opening (50) of the belljar (14).

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Improving Resistivity and Thickness Uniformity of Epitaxial Deposits, IBM Technical Disclosure Bulletin, L.M. Elijah, vol. 13, No. 12, May 1971.

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