Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S358000, C257S379000, C257S380000, C257S581000

Reexamination Certificate

active

11261794

ABSTRACT:
The semiconductor device comprises a resistance element26formed of polysilicon film formed on a silicon substrate10, which includes a resistor part26ahaving a resistance value set at a prescribed value, contact parts26bformed on both sides of the resistor part26aand connected to a line for applying a fixed potential, and a heat radiation part26cconnected to the contact part26b, whereby the semiconductor device can include the resistance element having a small parasitic capacitance and good heat radiation.

REFERENCES:
patent: 5510642 (1996-04-01), Ogawa
patent: 6958523 (2005-10-01), Babcock et al.
patent: 61-43464 (1986-03-01), None
patent: 2-283058 (1990-11-01), None
patent: 3-171657 (1991-07-01), None
patent: 03-171657 (1991-07-01), None
patent: 3-248458 (1991-11-01), None
patent: 5-13565 (1993-01-01), None
patent: 7-106511 (1995-04-01), None
patent: 7-142677 (1995-06-01), None
patent: 07-142677 (1995-06-01), None
patent: 2001-257317 (2001-09-01), None
Korean Office Action dated Dec. 13, 2006, issued in Korean Application No. 10-2005-7022558.
Chinese Office Action dated Sep. 21, 2007, issued in Chinese Application No. 038265532.

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