Plating method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C430S315000

Reexamination Certificate

active

10408428

ABSTRACT:
Photoresist compositions and methods suitable for depositing a very thick photoresist layer in a single coating process are provided. Such photoresist layers are particularly suitable for use in chip scale packaging.

REFERENCES:
patent: 4592816 (1986-06-01), Emmons et al.
patent: 4629680 (1986-12-01), Iwasaki et al.
patent: 4794021 (1988-12-01), Potter
patent: 5055164 (1991-10-01), Hawkins et al.
patent: 5202222 (1993-04-01), Harris et al.
patent: 5965328 (1999-10-01), Sano et al.
patent: 6110643 (2000-08-01), Rath et al.
patent: 2004/0063025 (2004-04-01), Natori et al.
patent: 0 223 114 (1987-05-01), None
patent: 0 529 643 (1993-03-01), None
patent: 0 855 620 (1998-07-01), None
patent: 1 148 548 (2001-10-01), None
patent: 10-2001-0027380 (2001-04-01), None
Lehar et al., “Solvent Content of Thick Photoresist Films”, Proceedings of SPIE, vol. 3999 (2000), pp. 442-451.
Pham et al., “IC-compatible process for pattern transfer in deep wells for integration of RF components”, In Micromachining and Microfabrication Process Technology VI, Jean-Michel Karam, John Yasaitis, Editors, Proceedings of SPIE, vol. 4174 (2000), pp. 390-397.
Oberlander et al., “Development of an Edge Bead Remover (EBR) for Thick Films”, Advances in Resist Technology and Processing XVIII, Francis M. Houlihan, Editor, Proceedings of SPIE vol. 4345 (2001), pp. 475-483.
Lehar et al., “Resist Re-Hydration During Thick Film Processing”, Advances in Resist Technology and Processing XVIII, Francis M. Houlhan, Editor, Proceedings of SPIE vol. 4345 (2001), pp. 463-474.
Clifford Hamel, Karl Suss America, Inc., Waterbury Center, VT, pp. 1-12.

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