Method for forming metal pattern and electromagnetic...

Details Method for forming metal pattern and electromagnetic... Method for forming metal pattern and electromagnetic...

2008-03-04

2008-03-04

Santiago, Mariceli (Department: 2879)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C977S700000, C430S312000, C430S321000

Reexamination Certificate

active

10844377

ABSTRACT:
Disclosed herein are a method for forming a highly electrically conductive metal pattern and an electromagnetic interference filter (EMI filter) using a metal pattern formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, (ii) selectively exposing the photocatalytic film to light to form a latent pattern acting as a nucleus for crystal growth, and (iii) plating the latent pattern to grow metal crystals thereon. The EMI filter comprises the metal pattern. According to the method, a highly electrically conductive metal wiring pattern can be rapidly and efficiently formed, when compared to conventional methods. In addition, the EMI filter comprising the metal pattern not only exhibits excellent performance, but also is advantageous in terms of low manufacturing costs and simple manufacture processes. Accordingly, the EMI filter can be broadly applied to flat panel display devices, such as plasma display panels (PDPs).

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