Projection objective of a microlithographic exposure apparatus

Details Projection objective of a microlithographic exposure apparatus Projection objective of a microlithographic exposure apparatus

2007-10-02

2007-10-02

Sugarman, Scott J. (Department: 2873)

Optical: systems and elements

Lens

Fluid

C359S740000

Reexamination Certificate

active

11097398

ABSTRACT:
A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.

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