Methods for improving angled line feature accuracy and...

Details Methods for improving angled line feature accuracy and... Methods for improving angled line feature accuracy and...

2007-06-12

2007-06-12

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S312000, C430S328000, C430S394000, C430S942000, C250S492300

Reexamination Certificate

active

10824279

ABSTRACT:
Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam may be relatively altered such that the substrate is exposed to the electron beam to form the angled features as if they were non-angled features. In another exemplary embodiment, the electron beam lithography system determines whether it is necessary to relatively alter the orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam to form the angled features based on the number of angled features and the time required for relatively altering the orientation. Electron beam lithography systems employing a rotatable stage, rotatable apertures, or both, are also disclosed.

REFERENCES:
patent: 4532598 (1985-07-01), Shibayama et al.
patent: 5650631 (1997-07-01), Sohda et al.
patent: 5760410 (1998-06-01), Matsuki et al.
patent: 6259106 (2001-07-01), Boegli et al.
patent: 6455863 (2002-09-01), Babin et al.
patent: 6573516 (2003-06-01), Kawakami
patent: 6605811 (2003-08-01), Hotta et al.

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