Method for binding halide-based contaminants during...

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

Reexamination Certificate

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C427S250000, C427S253000, C427S255360, C427S255390, C438S680000, C438S685000, C438S785000

Reexamination Certificate

active

10230592

ABSTRACT:
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.

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