Exposure method and device for forming patterns on printed...

Details Exposure method and device for forming patterns on printed... Exposure method and device for forming patterns on printed...

2007-02-20

2007-02-20

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S394000, C438S446000, C347S233000, C347S234000, C347S235000, C347S239000

Reexamination Certificate

active

10328449

ABSTRACT:
An optical exposure method and a device are used for forming patterns on a printed board wiring or semiconductor board. A single exposing region of a surface to be exposed is irradiated with a plurality of optical beams having different irradiating areas and different scanning pitches, such as, a peripheral area is irradiated with an optical beam having a smaller irradiating area and an inner area is irradiated with an optical beam having a larger irradiating area.

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