Method of manufacturing substrate for electro-optical...

Details Method of manufacturing substrate for electro-optical... Method of manufacturing substrate for electro-optical...

2007-06-05

2007-06-05

Mulpuri, Savitri (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S250000, C438S706000

Reexamination Certificate

active

10964732

ABSTRACT:
Exemplary embodiments provide a method of manufacturing a substrate for an electro-optical device. The method includes sequentially depositing on the substrate a lower conductive layer which is a lower electrode of the capacitor, an intermediate layer which is a dielectric film of the capacitor, and an upper conductive layer which is an upper electrode of the capacitor, in which the lower conductive layer is made of a material having an etching rate lower than an etching rate of a material of the upper conductive layer with respect to a predetermined etching agent; forming a mask having a predetermined planar pattern on the upper conductive layer; patterning the upper conductive layer, the intermediate layer and the lower conductive layer by etching with the mask, in which the etching agent is applied to at least the upper conductive layer and the lower conductive layer; and removing the mask. Accordingly, it is possible to simply manufacture a high reliable capacitor on the substrate.

REFERENCES:
patent: 6207465 (2001-03-01), Cuchiaro et al.
patent: 6271082 (2001-08-01), Hou et al.
patent: 6335551 (2002-01-01), Takemura
patent: 6500678 (2002-12-01), Aggarwal et al.
patent: 6552384 (2003-04-01), Murata et al.
patent: 6855565 (2005-02-01), Kanaya et al.
patent: 6927124 (2005-08-01), Suzuki
patent: 2002/0036305 (2002-03-01), Sameshima
patent: 2003/0205738 (2003-11-01), Kanaya et al.
patent: 2003/0211685 (2003-11-01), Ohyagi
patent: 2005/0110062 (2005-05-01), Natori et al.
patent: A 2002-100745 (2002-04-01), None
patent: 2003298022 (2003-10-01), None
patent: 1999-0083290 (1999-11-01), None

Affiliated with

Also associated with

Rating

Method of manufacturing substrate for electro-optical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing substrate for electro-optical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing substrate for electro-optical... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3817961