Method of fabricating micro-chips

Details Method of fabricating micro-chips Method of fabricating micro-chips

2007-06-05

2007-06-05

Luu, Chuong Anh (Department: 2818)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S489000, C438S458000, C438S689000

Reexamination Certificate

active

10711399

ABSTRACT:
A method of fabricating micro-chips, including: (a) providing a substrate; (b) forming a first single-crystal layer on a top surface of the substrate; (c) forming a second single-crystal layer on a top surface of the first single-crystal layer; (d) forming integrated circuits in the second single-crystal layer; (e) forming a set of intersecting trenches in the second-single crystal layer to form single-crystal islands, each single-crystal island containing one or more of the integrated circuits, the first single-crystal layer exposed in a bottom of the trench; and (f) removing the first single-crystal layer in order to separate the single-crystal islands from the substrate.

REFERENCES:
patent: 6331444 (2001-12-01), Ferrari et al.
patent: 6764936 (2004-07-01), Daneman et al.

Affiliated with

Also associated with

Rating

Method of fabricating micro-chips does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating micro-chips, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating micro-chips will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3809546