Method for forming pattern using a photomask

Details Method for forming pattern using a photomask Method for forming pattern using a photomask

2007-07-31

2007-07-31

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000, C430S322000, C430S396000

Reexamination Certificate

active

11402947

ABSTRACT:
A photomask has a semi-light-shielding portion having a light-shielding property and a light-transmitting portion surrounded by the semi-light-shielding portion, and a peripheral portion positioned in the periphery of the light-transmitting portion. The semi-light-shielding portion and the light-transmitting portion transmit exposure light in the same phase, whereas the peripheral portion transmits exposure light in a phase opposite to that of the light-transmitting portion.

REFERENCES:
patent: 5766805 (1998-06-01), Lee et al.
patent: 5906910 (1999-05-01), Nguyen et al.
patent: 7045255 (2006-05-01), Misaka
patent: 08-227142 (1996-09-01), None
patent: 9-90601 (1997-04-01), None
patent: 10-048806 (1998-02-01), None
patent: 2000-019710 (2000-01-01), None

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